Atomic Layer Deposition for Semiconductors
Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discuss...
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| Formato: | Libro electrónico |
| Idioma: | Inglés |
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Boston, MA :
Springer US
2014.
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| Colección: | Springer eBooks.
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| Acceso en línea: | Conectar con la versión electrónica |
| Ver en Universidad de Navarra: | https://innopac.unav.es/record=b32978595*spi |
| Sumario: | Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discusses ALD for all modern semiconductor devices, the basic chemistry of ALD, and models of ALD processes. The book also details ALD for both mass produced memories and emerging memories. Each chapter of the book provides history, operating principles, and a full explanation of ALD processes for each device. |
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| Descripción Física: | X, 263 p., 170 il., 81 il. col |
| Formato: | Forma de acceso: World Wide Web. |
| ISBN: | 9781461480549 |
