Handbook of cleaning for semiconductor manufacturing fundamentals and applications
This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physic...
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| Formato: | Libro electrónico |
| Idioma: | Inglés |
| Publicado: |
Salem, Mass. ; Scrivener ; Hoboken, N.J. :
John Wiley & Sons, Inc
c2011.
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| Edición: | 1st edition |
| Colección: | Wiley-Scrivener
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| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009629018806719 |
| Sumario: | This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This |
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| Notas: | Description based upon print version of record. |
| Descripción Física: | 1 online resource (616 p.) |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 9781118099513 9781283374590 9786613374592 9781118071731 9781613441770 9781118071748 |
