Electromigration in thin films and electronic devices materials and reliability
Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area.Part one...
| Otros Autores: | |
|---|---|
| Formato: | Libro electrónico |
| Idioma: | Inglés |
| Publicado: |
Oxford ; Philadelphia :
Woodhead Pub
c2011.
|
| Edición: | 1st edition |
| Colección: | Woodhead Publishing Series in Electronic and Optical Materials
|
| Materias: | |
| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009628369806719 |
