Nano-lithography

Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and el...

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Detalles Bibliográficos
Otros Autores: Landis, Stefan (-)
Formato: Libro electrónico
Idioma:Inglés
Publicado: London : Hoboken, N.J. : ISTE ; Wiley 2011.
Edición:1st edition
Colección:ISTE
Materias:
Ver en Biblioteca Universitat Ramon Llull:https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009628173906719
Descripción
Sumario:Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,
Notas:"Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier"--t.p. verso.
Descripción Física:1 online resource (353 p.)
Bibliografía:Includes bibliographical references and index.
ISBN:9781118621707
9781118622582
9781299315587
9781118621622