Applications of Laser Ablation Thin Film Deposition, Nanomaterial Synthesis and Surface Modification

Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters...

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Detalles Bibliográficos
Otros Autores: Dongfang Yang (auth), Yang, Dongfang, editor (editor)
Formato: Libro electrónico
Idioma:Inglés
Publicado: Rijeka, Croatia : IntechOpen 2016
2016.
Materias:
Ver en Biblioteca Universitat Ramon Llull:https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009438432906719
Descripción
Sumario:Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.
Descripción Física:1 online resource (428 pages) : illustrations
Bibliografía:Includes bibliographical references.
ISBN:9789535141297
9789535128120
Acceso:Open access