Nanoimprint Lithography Technology and Applications

Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes aro...

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Detalles Bibliográficos
Otros Autores:	Mühlberger, Michael (Editor )
Formato:	Libro electrónico
Idioma:	Inglés
Publicado:	Basel MDPI - Multidisciplinary Digital Publishing Institute 2022
Materias:	Technology: general issues nanoimprint lithography polymer formulation development surface chemistry click chemistry plasmons Bragg SPPs angle of incidence grating organic solar cell ultraviolet nanoimprint lithography durability anisotropy contact angle line and space high aspect ratio micro-structure roll-to-plate nanoimprint lithography superhydrophobic oleophobic biomimetic surface large-area patterning negligible residual layer partial cavity filling guiding chart defect avoidance hydrodynamic instabilities T-NIL UV-NIL el-UV-NIL el-T-NIL optical planar waveguides roll-to-plate R2P nanoimprinting UV-curable polymers inorganic-organic hybrid polymer optical losses SmartNIL R2R UV-NIL neuronal cell assay nanoimprint lithography (NIL) undercut features master Blu-Ray patterning reactive ion etching biomimetics morpho butterfly
Ver en Biblioteca Universitat Ramon Llull:	https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009672611206719